| 摘要 |
A photomask formation method, a photomask, and a method for fabricating a semiconductor device are provided to reduce a mask formation cost by integrally managing drawing data necessary to form a photomask for use in the fabrication of the semiconductor device and information concerning mask defect inspection. A pattern obtained by coding information including inspection information for inspecting a photomask and an information attribute which identifies a type of the inspection information are formed on a photomask(S4). The inspection information is read from the pattern, and then the photomask is inspected on the basis of the read inspection information(S5). Two-dimensional barcodes are arranged when information is not expressed by one two-dimensional barcode or information attributes to be expressed by a two-dimensional barcode are different. |
