发明名称 Low temperature bonding of multilayer substrates
摘要 Exemplary embodiments of the present invention are drawn to improved systems and process for anodically bonding multiple substrate wafers to each other at low temperatures. At least one circuit wafer having printed circuits thereon is bonded to an interposer wafer by applying an amorphous thin film between the wafers. A low voltage is applied across the wafers to heat the wafers and to cause bonding of the wafers. Multiple circuit and interposer wafers can be used. The bonding temperature is low enough that soldered connections on the circuit wafers will not flow or otherwise distort, thus maintaining electrical integrity.
申请公布号 US7259466(B2) 申请公布日期 2007.08.21
申请号 US20030740241 申请日期 2003.12.17
申请人 FINISAR CORPORATION 发明人 FREEMAN WILLIAM;JIANG HONG JIN
分类号 H01L29/80;H01L21/48;H01L21/58;H01L31/112;H05K1/03;H05K3/46 主分类号 H01L29/80
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