发明名称 |
Polishing pad having grooved window therein and method of forming the same |
摘要 |
A polishing pad having grooved window therein is provided. The polishing pad comprises a polishing layer and a window, wherein the polishing layer has at least one first groove therein and the window has at least one second groove therein. More particularly, the first groove is deeper than the second groove. The polishing pad having a grooved window therein has advantages of providing precise endpoint detection and thereby reducing or resolving defect problems.
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申请公布号 |
US7258602(B2) |
申请公布日期 |
2007.08.21 |
申请号 |
US20040949048 |
申请日期 |
2004.09.24 |
申请人 |
IV TECHNOLOGIES CO., LTD. |
发明人 |
SHIH WEN-CHANG;CHANG YUNG-CHUNG;CHU MIN-KUEI |
分类号 |
B24D11/00;B24B37/04;B24B49/00 |
主分类号 |
B24D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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