发明名称 PATTERNING METHOD OF THIN FILM
摘要 <p>A method for patterning a thin film is provided to enhance the reproducibility and reliability, to improve the yield and to reduce manufacturing costs. A flexible substrate(100) is prepared. A groove(100a) of a micro pattern is formed on the flexible substrate. A thin film material of liquid phase is filled in the groove. A curing process is performed on the thin film material. The groove is formed on the flexible substrate by using a physical contact force. The groove is formed by using a rotation roll(10) or a press substrate. The rotation roll has a positive shape(10a) on the surface. The groove corresponding to the positive shape of the rotation roll is formed on the flexible substrate by driving the rotation roll.</p>
申请公布号 KR20070079413(A) 申请公布日期 2007.08.07
申请号 KR20060010056 申请日期 2006.02.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWON, JANG YEON;KIM, JONG MAN;PARK, KYUNG BAE;JUNG, JI SIM;TAKASHI NOGUCHI
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址