| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an algorithm most suitable for pattern decomposition in double exposure. <P>SOLUTION: The method includes (a) a step 14 of segmenting a plurality of the features into a plurality of polygons; (b) a step 16 of determining the image log slope (ILS) value for each of the plurality of polygons; (c) a step 18 of determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) a step 20 of convolving the mask defined in the step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) a step 22 of assigning a phase to the polygon based on the value of the interference map at a location each corresponding to the polygon, where the phase defines which exposure in the multi-exposure process the polygon is assigned. <P>COPYRIGHT: (C)2007,JPO&INPIT |
