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发明名称
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD
摘要
申请公布号
EP1799879(A1)
申请公布日期
2007.06.27
申请号
EP20040784214
申请日期
2004.09.14
申请人
OPTISOLAR INC.
发明人
KESHNER, MARVIN S.;MCCLELLAND, PAUL H.
分类号
C23C16/54
主分类号
C23C16/54
代理机构
代理人
主权项
地址
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