| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generator capable of introducing gas uniformly while preventing abnormal discharge and abnormal growth of a film. <P>SOLUTION: The plasma generator comprises a reactor connected with a microwave generator and generating plasmas with a microwaves generated by the microwave generator, a guide passage 10b for supplying gas to the reactor, and at least one nozzle 10a for coupling the rector with the guide passage 10b wherein the transmissivity T of the microwaves from the reactor to the nozzle substantially satisfies equation 1, where L<SB>1</SB>: length of the nozzle in the advancing direction of gas, A<SB>1</SB>: long diameter of the nozzle in the direction perpendicular to the advancing direction of gas, and λ: wavelength of a microwave in the reactor. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
