发明名称 |
Sputtering target material |
摘要 |
This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.
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申请公布号 |
US2007128456(A1) |
申请公布日期 |
2007.06.07 |
申请号 |
US20040575725 |
申请日期 |
2004.10.08 |
申请人 |
HASEGAWA KOICHI;ISHII NOBUO |
发明人 |
HASEGAWA KOICHI;ISHII NOBUO |
分类号 |
C23C14/00;C23C14/34;B32B15/04;C22C5/06;C23C14/20;G11B7/24;G11B7/258;G11B7/26 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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