发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 A substrate treatment apparatus, comprising a box-shaped treatment tank ( 11 ) having an opening part at its upper side and a cover body ( 21 ) openably covering the opening part of the treatment tank. The cover body ( 21 ) is characterized in that a drying chamber ( 23 ) storing and drying a treated substrate (W) is formed therein, the treatment tank ( 11 ) is so formed that at least three of treatment fluid feed nozzle tubes ( 14 a) to ( 14 c) and ( 14 a') to ( 14 c') are disposed at each of the opposed side wall faces thereof forming the box shape horizontally at specified intervals and these feed nozzle tubes ( 14 a) to ( 14 c) and ( 14 a') to ( 14 c') are formed to be connected to a switching mechanism to supply a treatment fluid from the opposed side wall sides while alternately switching them at the opposed side wall faces. Thus, the treatment of various types of chemical liquids, flushing, and drying can be performed in the same treatment tank.
申请公布号 KR20070055515(A) 申请公布日期 2007.05.30
申请号 KR20077004739 申请日期 2007.02.27
申请人 S.E.S CO., LTD. 发明人 NAKATSUKASA KATSUYOSHI;YAMAGUCHI HIROSHI;OGASAWARA KAZUHISA;KIZAWA HIROSHI
分类号 H01L21/304 主分类号 H01L21/304
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