| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device capable of restraining leakage of the electromagnetic waves. <P>SOLUTION: A sheathed heater 105 and a sheathed thermocouple 108 are stretched across a base board stand 102 and a flange 111, penetrated through the flange 111, and extracted to the outside of a vacuum chamber 101. For example, the flange 111 is constituted by stainless steel and is fixed so as to airtightly block the opening arranged at a prescribed lower part of a container 101a. The sheathed heater 105 and the sheathed thermocouple 108 are welded to a penetration part of the flange 111 at a welding part 110, and fixed to the flange 111 in an airtightly sealed state. <P>COPYRIGHT: (C)2007,JPO&INPIT |
