发明名称 PHOTOSENSITIVE PASTE
摘要 <p>A photosensitive paste is provided to form the compartment of a rear plate of the plasma display, which has very small alteration in size of the compartment although amount of glass particles is increased by comprising surface modified glass particles, alkali-soluble resin and a compound generating acid via ionizing radiation. The photosensitive paste includes: (A) 10 to 80wt.% of surface modified glass particles treated by organic compound; (B) 3 to 30wt.% of alkali soluble resin or a resin soluble in alkali by acid; (C) 0.01 to 20wt.% of a compound generating the acid by ionizing radiation; and (D) 1 to 30wt.% of organic solvent. The surface modified glass particle is formed by steps of: (1) adhering and combining normal particle with the organic compound having carbon-carbon unsaturated bonds; and (2) copolymerizing the prepared glass particle with at least one monomer selected from methacrylic acid, acrylic acid, vinyl acetate and vinyl benzoate by interposing the carbon-carbon bonds.</p>
申请公布号 KR20070024380(A) 申请公布日期 2007.03.02
申请号 KR20060079799 申请日期 2006.08.23
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 YAHAGI ISAO
分类号 G03F7/004 主分类号 G03F7/004
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