FOCUS DETERMINATION METHOD, DEVICE MANUFACTURING METHOD, AND MASK

摘要

A focus determining method, a device manufacturing method and a mask are provided to select a predetermined structure with a short cycle by determining optimum focus setting. A plurality of target markers are printed on a substrate by using a lithographic apparatus(S1). At this time, the plurality of target markers are sorted to various focus setting groups. An angle-resolved scatterometer is used for measuring the characteristics of the target markers(S2). One or more focus setting groups are determined on the basis of the measured characteristics of the target markers(S3). The target markers include a structure and a sub-structure.