发明名称 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
摘要 A photosensitive composition comprising: (A) a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation, a pattern forming method using the photosensitive composition, and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.
申请公布号 US2006264528(A1) 申请公布日期 2006.11.23
申请号 US20060438728 申请日期 2006.05.23
申请人 FUJI PHOTO FILM CO., LTD. 发明人 WADA KENJI
分类号 C08J3/28 主分类号 C08J3/28
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