发明名称 |
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
摘要 |
A photosensitive composition comprising: (A) a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation, a pattern forming method using the photosensitive composition, and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.
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申请公布号 |
US2006264528(A1) |
申请公布日期 |
2006.11.23 |
申请号 |
US20060438728 |
申请日期 |
2006.05.23 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
WADA KENJI |
分类号 |
C08J3/28 |
主分类号 |
C08J3/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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