发明名称 GALLIUM NITRIDE SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for growing a gallium nitride single crystal into which oxygen can be incorporated as an n-type dopant. SOLUTION: A gallium nitride crystal is doped with oxygen by using a seed crystal having a non-C-plane as a surface (top face) to grow a gallium nitride crystal in a vapor phase while keeping the non-C-plane surface by supplying a source material gas containing a gallium source material, a nitrogen source material and oxygen for doping and allowing oxygen to infiltrate through the surface. Otherwise, a gallium nitride crystal is doped with oxygen by using a seed crystal having a C-plane as the surface, producing a non-C-plane facet to grow a gallium nitride crystal in a vapor phase in the c-axis direction while keeping the facet by supplying a source material gas containing a gallium source material, a nitrogen source material and oxygen for doping, and allowing oxygen to infiltrate through the facet. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006282504(A) 申请公布日期 2006.10.19
申请号 JP20060137194 申请日期 2006.05.17
申请人 SUMITOMO ELECTRIC IND LTD 发明人 MOTOKI KENSAKU;UENO MASANORI
分类号 C30B29/38;C30B25/18;H01L21/205 主分类号 C30B29/38
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