| 发明名称 |
Polishing slurry composition and method of using the same |
| 摘要 |
A polishing slurry composition including an abrasive, a pH-adjusting agent, a water-soluble thickening agent, and a chelating agent, wherein the chelating agent includes at least one of an acetate chelating agent and a phosphate chelating agent, and a method of using the same.
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| 申请公布号 |
US2006196850(A1) |
申请公布日期 |
2006.09.07 |
| 申请号 |
US20060367406 |
申请日期 |
2006.03.06 |
| 申请人 |
ROH HYUN S;PARK TAE W;LEE TAE Y;LEE IN K;LEE CHIN H;KIM YOUNG W;CHOI MOON R;KIM JONG S |
发明人 |
ROH HYUN S.;PARK TAE W.;LEE TAE Y.;LEE IN K.;LEE CHIN H.;KIM YOUNG W.;CHOI MOON R.;KIM JONG S. |
| 分类号 |
C09K13/00;B44C1/22;C23F1/00;H01L21/461 |
主分类号 |
C09K13/00 |
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