METHOD TO CREATE AIR GAPS USING NON-PLASMA PROCESSES TO DAMAGE ILD MATERIALS

摘要

A method of forming airgaps is provided where a blocking mask is applied to a substrate to shield a portion of the substrate from a beam of energy. After irradiation, the blocking mask is removed and a capping material is applied to the substrate. Alternatively, the capping material may be applied before irradiation. The capping material is perforated to allow an etchant to pass therethrough to the substrate below the capping material. The exposed portions of the substrate are removed from underneath the capping material by etching. The capping material is then sealed leaving sealed airgaps within the substrate.