| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate that sticks and holds trace of specific material in a trace region with good reproducibly with high density, and is suitable for optical measurement. SOLUTION: A masking pattern is applied onto the substrate to etch it using a material having a slightly weak adhesion force with the substrate. Since the adhesion force between the mask and the substrate is weak, the mask 4 peels from the substrate surface, a clearance 5 occurs between the mask 4 and the substrate 1, and anisotropic etching is performed. In such a method, the substrate for optical measurement of which the sectional shape has a recessed shape approximatable with a curve having an inflection point is easily manufactured. Even when the measuring beam is made to come at an angle lower than 45°, no loss is made in the incident light and reflected light, and the optical characteristic of a micro amount of material is efficiently evaluated. COPYRIGHT: (C)2006,JPO&NCIPI
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