发明名称 |
Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators |
摘要 |
An electron-beam deposition system includes an evaporation source having a source target with a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location. A trailing-indicator monitor measures a past evaporation performance of the evaporation source and has a trailing-indicator output, and a leading-indicator monitor measures a future evaporation performance of the evaporation source and has a leading-indicator output. A controller receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output. Preferably, the trailing-indicator monitor measures a deposition of the deposition material on a monitored substrate, and the leading-indicator monitor measures a brightness of the deposition material in the evaporation source.
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申请公布号 |
US2006169920(A1) |
申请公布日期 |
2006.08.03 |
申请号 |
US20050046484 |
申请日期 |
2005.01.28 |
申请人 |
RAYTHEON COMPANY, A CORPORATION OF THE STATE OF DELAWARE |
发明人 |
GABURA ANDREW J.;HARRIS GEOFFREY G. |
分类号 |
G01K1/08;H01J3/14;H01J37/08 |
主分类号 |
G01K1/08 |
代理机构 |
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主权项 |
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地址 |
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