METHOD FOR FABRICATING SEMICONDUCTOR SUBSTRATE,申请号KR20040115437-传众专利搜索

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发明名称	METHOD FOR FABRICATING SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	KR20060076674(A)	申请公布日期	2006.07.04
申请号	KR20040115437	申请日期	2004.12.29
申请人	SILTRON INC.	发明人	KIM, IN KYUM;LEE, DONG KUN
分类号	H01L21/20	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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