FILM FORMING APPARATUS AND METOD, PROGRAM, AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To execute a clean formed film forming on a substrate under processing in a film forming method using a film forming gas composed of metal alkoxide with suppressing aluminum or aluminum alloy in a process container from eluting to suppress contamination on the substrate. SOLUTION: The method of forming the thin film on a substrate under processing held in a process container comprises a step of heating the substrate and a step of feeding a film forming gas in the process container. The forming gas is composed of metal alkoxide, and the process container made of aluminum or its alloy has a non-porous anodic-oxidated protective film on the inner wall of the process container. COPYRIGHT: (C)2006,JPO&NCIPI