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发明名称
METHOD FOR FORMING THE ISOLATION LAYER
摘要
申请公布号
KR20060032730(A)
申请公布日期
2006.04.18
申请号
KR20040081671
申请日期
2004.10.13
申请人
HYNIX SEMICONDUCTOR INC.
发明人
KWON, HYUK
分类号
H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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