| 摘要 |
Disclosed is an apparatus for exposing a wafer with light, which includes a chamber for enclosing at least a portion of a path of the light, and a circulation system having a fan unit, an inactive gas supplying path from the fan unit to the chambers and an inactive gas return unit from the chamber to the fan unit, the circulation system being arranged to circulate an inactive gas through the chamber, wherein a pressure loss at the return path is smaller than a positive pressure being set with respect to a gas pressure inside the chamber.
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