EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus or the like which efficiently corrects a rotation asymmetrical aberration component generated in a projection optical system. The exposure apparatus is provided with adjusting mechanisms (40, etc.) for adjusting dynamic rotation asymmetrical optical characteristics of the projection optical system (PL) and adjusting mechanisms (22, etc.) for adjusting static rotation asymmetrical optical characteristics of the projection optical system (PL). A main control system (20) changes an adjusting quantity of the adjusting mechanisms (40, etc.) which adjust the optical characteristics of the projection optical system (PL) in accordance with the cross section shape and sizes of exposure light (IL) on a plane coupled to an image plane of the projection optical system (PL).