发明名称 Method for forming interconnects on thin wafers
摘要 A method of forming a semiconductor interconnect including, in the order recited: (a) providing a semiconductor wafer; (b) forming bonding pads in a terminal wiring level on the frontside of the wafer; (c) reducing the thickness of the wafer; (d) forming solder bumps on the bonding pads; and (e) dicing the wafer into bumped semiconductor chips.
申请公布号 US2005272241(A1) 申请公布日期 2005.12.08
申请号 US20050184695 申请日期 2005.07.19
申请人 GARDECKI LEONARD J;PALMER JAMES R;PROBSTFIELD ERIK M;WIRSING ADOLF E 发明人 GARDECKI LEONARD J.;PALMER JAMES R.;PROBSTFIELD ERIK M.;WIRSING ADOLF E.
分类号 H01L21/60;(IPC1-7):B24B1/00;B24B7/19;B24B7/30;H01L21/44 主分类号 H01L21/60
代理机构 代理人
主权项
地址