| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an X-ray catoptric element which has high configuration precision, a method for manufacturing it and an X-ray reduction projection exposure system with it. <P>SOLUTION: In the X-ray catoptric element 1 with cylindrical faces shaped convexly or concavely which reflect parallel X-ray beams, the cylindrical faces are formed above a hollow structure 2 by grinding and polishing the surface of a matrix of the element 1 through the control over the amount of the elastic deformation of the hollow structure 2 placed in each of the cylindrical faces for the matrix of the element 1 and a reflective film and the like are formed as necessary on the cylindrical faces shaped convexly or concavely via a reflective film or a stress adjustment film. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
