发明名称 |
COPOLYMER FILM, AND METHOD FOR FORMING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a copolymer film having a plurality of organic monomers in the skeleton by feeding two or more material monomers of specific structures for copolymerization on the surface for an effective reduction in the dielectric constant of an organic film to be utilized as a semiconductor device-constituting interlayer insulating film. SOLUTION: Two or more organic monomers with specific structures of vapor phase state are sprayed through plasma generated in the reaction chamber onto a heated substrate surface for the formation of a copolymer film having a plurality of organic monomers in the skeleton. This results in an organic polymer film with the dielectric constant throughout the whole organic polymer film effectively reduced, with the mechanical strength and film formation speed simultaneously improved. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005340652(A) |
申请公布日期 |
2005.12.08 |
申请号 |
JP20040159796 |
申请日期 |
2004.05.28 |
申请人 |
NEC CORP;SUMITOMO CHEMICAL CO LTD;ASM JAPAN KK |
发明人 |
KAWAHARA JUN;KINOSHITA KEIZO;KUNIMI NOBUTAKA;NAKANO AKINORI |
分类号 |
C07F7/18;C08F30/08;C08F212/34;C08F238/00;C08F238/02;C23C14/12;H01L21/312;(IPC1-7):H01L21/312 |
主分类号 |
C07F7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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