SPUTTER TARGETS AND METHODS OF FORMING SAME BY ROTARY AXIAL FORGING
摘要
<p>A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.</p>
申请公布号
WO2005108639(A1)
申请公布日期
2005.11.17
申请号
WO2005US15839
申请日期
2005.05.06
申请人
CABOT CORPORATION;MATERA, JOHN, P.;FORD, ROBERT, B.;WICKERSHAM, CHARLES, E., JR.
发明人
MATERA, JOHN, P.;FORD, ROBERT, B.;WICKERSHAM, CHARLES, E., JR.
