发明名称 |
Method of fabricating a desired pattern of electronically functional material |
摘要 |
Provided is a method forming a desired pattern of electronically functional material 3 on a substrate 1 . The method comprises the steps of: creating a first layer of patterning material 2 on the substrate whilst leaving areas of the substrate exposed to define said desired pattern; printing a suspension comprising particles of the electronically functional material 3 in a liquid dispersant, to which the patterning material is impervious, on the patterning material and the exposed substrate; removing at least some of the liquid dispersant from the suspension to consolidate the particles; and applying a first solvent to said consolidated particles which is capable of solubilizing the patterning material 2 and to which the consolidated particles are pervious so that the patterning material is removed from the substrate 1 together with any overlying electronically functional material 3.
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申请公布号 |
US2005250244(A1) |
申请公布日期 |
2005.11.10 |
申请号 |
US20050102711 |
申请日期 |
2005.04.11 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
LI SHUNPU;NEWSOME CHRISTOPHER;KUGLER THOMAS;RUSSEL DAVID |
分类号 |
B41M5/00;B05D1/26;B05D3/12;G03F7/20;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L21/84;H01L29/786;H01L51/00;H01L51/05;H01L51/30;H01L51/40;(IPC1-7):H01L21/84 |
主分类号 |
B41M5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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