MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCUSED ION BEAM SYSTEM
摘要
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
申请公布号
WO2005081940(A2)
申请公布日期
2005.09.09
申请号
WO2005US05643
申请日期
2005.02.18
申请人
FEI COMPANY;AUSTRALIAN NATIONAL UNIVERSITY;KELLER, JOHN;SMITH, NOEL;BOSWELL, RODERICK;LAWRENCE, SCIPIONI;CHARLES, CHRISTINE;SUTHERLAND, ORSON
