Linewidth control using an angular distribution of radiation depending on position in the illumination field

摘要

Electromagnetic energy is emitted from an illumination source of a lithography device. A portion of the emitted electromagnetic energy passes through an illumination optics module. The illumination optics module includes a one-dimensional optical transform element (602) having a pupil plane (702). An aperture device having an adjustable aperture is located proximate to the pupil plane so that a portion of the electromagnetic energy recieved by the one-dimensional optical transform element passes through the aperture of the aperture device. The angular distribution of the electromagnetic energy passing through the illumination optics module is adjusted as a function of illumination field position using the aperture device, thereby improving line width control in the lithography device.