| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask fixing apparatus which can efficiently fix a large mask, prevent refraction of light and improve precision of patterning without using another supporting member, and to provide an exposure system and an exposure method using it. SOLUTION: The mask fixing apparatus includes an adsorption glass having at least one vacuum hole, a mask having a predetermined pattern and attached to the bottom face of the adsorption glass, and an adsorption pad to define a specified space between the adsorption glass and the mask. Air in the space is discharged to the outside through the vacuum hole to securely fix the mask on the adsorption glass. COPYRIGHT: (C)2005,JPO&NCIPI |
