Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus

摘要

To inspect the polarization state of light flux for exposure of an exposure apparatus, a mask for inspection is held at the photomask position. This mask for inspection comprises a polarizing element which is disposed in a light path of light flux forming an image of a light source and which can selectively transmit light flux with a plurality of polarization directions.