LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; an article support (1) for supporting a flat article (6) to be placed in a beam path of said projection beam of radiation on said article support (1), comprising a plurality of supporting protrusions (2), said plurality of protrusions (2) defining a support zone (3) for providing a flat plane of support; and a backfill gas feed (5) arranged in said support zone (3) for providing a backfill gas flow to a backside of said article (6) when supported by said article support (1), for providing an improved thermal conduction between said article (6) and said article support (1). According to the invention, said support zone (3) is surrounded by a boundary zone (4) having a reduced height relative to said plane of support so that said backfill gas flow is not bounded to said support zone (3).