Valve system of thin-firm deposition apparatus for atomic layer deposition,申请号KR20020045821-传众专利搜索

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发明名称	Valve system of thin-firm deposition apparatus for atomic layer deposition
摘要
申请公布号	KR100483208(B1)	申请公布日期	2005.04.15
申请号	KR20020045821	申请日期	2002.08.02
申请人		发明人
分类号	H01L21/203;(IPC1-7):H01L21/203	主分类号	H01L21/203
代理机构		代理人
主权项
地址

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