Illumination system for microlithography projection exposure system, has mirror arrangement with array of individual mirrors that is controlled individually by changing angular distribution of light incident on mirror arrangement

摘要

A light distribution device (25) receives light from a primary light source (11) e.g. laser and produces two-dimensional intensity distribution which is set variably in pupil-shaped surface (31). The mirror arrangement (20) has array of individual mirrors (21) that is controlled individually by changing the angular distribution of light incident on mirror arrangement. An independent claim is also included for method of producing semiconductor components.