发明名称 SENSOR WELL UNIT AND MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent variations in the position of a sensor well unit in a measuring apparatus for measuring the state of total reflection attenuation. SOLUTION: First and second flange parts 24 and 25 each provided with lower surfaces 24b and 25b extended approximately in parallel with an interface 23b between the upper surface of a dielectric block 22 and a membrane layer 12 are formed in the sensor well unit 20. A first hole 24d for tightly receiving part of a first objet (for example, a spherical body) 31, having a contact part of a circular cross section and specifying the position of the first flange part 24 to the object 31 is formed in the lower surface 24b of the first flange part 24. A second long hole 25d, having a large diameter along the arrangement direction of the flange parts 24 and 25 for receiving part of a second object (for example, a spherical body) 32, having a contact part of a circular cross section, is formed in the lower surface 25b of the second flange part 25. The objects 31 and 32 are mounted to the side of the measuring apparatus, to specify the position of the sensor well unit 20 by the engagement between the first object 31 and the first hole 24d and the engagement between the second object 32 and the second hole 25d. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005098793(A) 申请公布日期 2005.04.14
申请号 JP20030331707 申请日期 2003.09.24
申请人 FUJI PHOTO FILM CO LTD 发明人 KUNUKI YOSHIYUKI
分类号 G01N21/03;G01N21/27;(IPC1-7):G01N21/27 主分类号 G01N21/03
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