| 发明名称 |
POSITIVE RADIATION-SENSITIVE COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive composition having characteristics of both of high sensitivity and high resolution. <P>SOLUTION: The positive radiation-sensitive composition contains: (a) a polymer obtained by polyaddition of a polyvalent phenol compound having 2 to 7 phenolic hydroxyl groups and a polyvalent vinylether compound having 2 to 4 vinylether groups; (b) an acid generating agent which generates an acid by irradiation of radiation; and (c) an amine compound. The proportion of the amine compound is ≥0.6 wt.% with respect to the polymer. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005099246(A) |
申请公布日期 |
2005.04.14 |
| 申请号 |
JP20030331249 |
申请日期 |
2003.09.24 |
| 申请人 |
TORAY IND INC |
发明人 |
SENOO MASAHIDE;TAMURA KAZUTAKA;FUJII MASAMITSU |
| 分类号 |
G03F7/039;C08G83/00;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
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