METHOD FOR MANUFACTURING THIN FILM, METHOD FOR MANUFACTURING WIRE ROD WITH THIN FILM, AND VAPOR DEPOSITION APPARATUS WITH PULSED LASER

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film, which forms the thin film on a substrate with a large area and a wide wire rod and solves a problem that a vapor deposition method with a conventional pulsed laser beam forms a practically-uniform thin film on just a narrow region. SOLUTION: In the vapor deposition method with the pulsed laser beam for forming the thin film on the substrate through irradiating a target with a laser beam to form plasma and depositing the vaporized target material on the substrate, this film-forming method comprises condensing the laser beam 33 on the target 31 so as to form a linear shape, and arranging the substrate to be film-formed within a range of plus and minus 45 degrees from the Y axis when viewed from a Z direction, when the origin is supposed to be located in the center of the linear laser beam on the irradiated surface of the target 31, the Z axis to be a long side direction, an X-axis to be a short side direction and the Y axis to be the normal direction with respect to a target face. COPYRIGHT: (C)2005,JPO&NCIPI