| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure deviation measuring device which reduces alignment errors by measuring an exposure deviation. SOLUTION: The device comprises: position detecting means 12 to 19 and 23 which detect the position of a measurement pattern on a first coordinate system, the pattern being formed on a substrate 11 by the exposure of an aligner; and a calculating means 23 which calculates a deviation of the design position of the measurement pattern from the detected position based on the design position of the measurement pattern on a second coordinate system set on the substrate during the exposure of the aligner, the detected position of the measurement pattern on the first coordinate system, and a relative positional relationship between the first coordinate system and the second coordinate system. COPYRIGHT: (C)2005,JPO&NCIPI
|
