发明名称 |
Empty tank replacement method for resist tank used in semiconductor photolithography system has capacitive level and bubble sensors and machine readable code on tank |
摘要 |
<p>A capacitive level sensor (16) and bubble sensor (15) determine whether the resist tank (2) is empty or sufficiently full. The photolithography system (1) is paused on detection of an 'empty' signal or when a 'full' signal is not detected to allow insertion of a replacement tank. A machine readable code on the tank is scanned prior to insertion and compared with a correct code stored in a database (25). The system will only restart if the codes match. An independent claim is included for an apparatus for carrying out the method.</p> |
申请公布号 |
DE10317268(A1) |
申请公布日期 |
2004.11.04 |
申请号 |
DE2003117268 |
申请日期 |
2003.04.14 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
DONAUBAUER, HARALD;ADLER, PETER;HAEUSER, ERICH |
分类号 |
B67D7/34;B67D7/56;G01F23/00;G03F7/16;G05B9/02;G05B23/02;H01L21/30;H01L21/66;(IPC1-7):H01L21/30 |
主分类号 |
B67D7/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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