| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition excellent line edge roughness and improved to reduce the scum. <P>SOLUTION: The positive resist composition contains: (A) a compound which generates acid by irradiation of active rays or radiation; (B) a resin insoluble or hardly soluble with an alkali developing solution and changed into soluble with an alkali developing solution by the effect of an acid; and (C) a compound having at least one cyclic ether group and at least one alicyclic group. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
