| 发明名称 |
Etching method |
| 摘要 |
An object of this invention is to suppress the amount of etchant used. A liquid etchant is stored in an etchant vessel, and vaporized by a vaporization unit. A fragile layer such as a porous layer is selectively etched with the vaporized etchant.
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| 申请公布号 |
US2004169011(A1) |
申请公布日期 |
2004.09.02 |
| 申请号 |
US20040754531 |
申请日期 |
2004.01.12 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TAKANASHI KAZUHITO;YAMAGATA KENJI;SAKAGUCHI KIYOFUMI;YANAGITA KAZUTAKA;SUGAI TAKASHI;TSUBOI TAKASHI |
| 分类号 |
H01L21/302;H01L21/00;H01L21/306;H01L21/3063;H01L21/316;H01L21/762;(IPC1-7):B44C1/22 |
主分类号 |
H01L21/302 |
| 代理机构 |
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