发明名称 |
SUBSTRATE FOR ANALYZING POLYMER, ARRAY FOR ANALYZING POLYMER AND POLYMER ANALYZING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To make performable an analysis accurately with high sensitivity by regulating the content of impurities and to make performable an analysis by accurately recognizing an analyzing target position. SOLUTION: In a polymer analyzing method of analyzing a polymer to be analyzed formed on a substrate using laser aberration, the content of a labelled element in a substrate material is set to be≤1 ppm and position information is formed on a polymer part and/or a substrate. COPYRIGHT: (C)2004,JPO&NCIPI
|
申请公布号 |
JP2004212206(A) |
申请公布日期 |
2004.07.29 |
申请号 |
JP20020381888 |
申请日期 |
2002.12.27 |
申请人 |
INSTITUTE OF PHYSICAL & CHEMICAL RESEARCH;HAYASHIZAKI YOSHIHIDE;TORAY IND INC |
发明人 |
HAYASHIZAKI YOSHIHIDE;TANIHATA ISAO;NOBUMASA HITOSHI;HIKASA MASAFUMI |
分类号 |
G01N27/64;G01N27/62;G01N33/483;G01N33/53;G01N37/00;(IPC1-7):G01N27/64 |
主分类号 |
G01N27/64 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|