发明名称 SUBSTRATE FOR ANALYZING POLYMER, ARRAY FOR ANALYZING POLYMER AND POLYMER ANALYZING METHOD
摘要 PROBLEM TO BE SOLVED: To make performable an analysis accurately with high sensitivity by regulating the content of impurities and to make performable an analysis by accurately recognizing an analyzing target position. SOLUTION: In a polymer analyzing method of analyzing a polymer to be analyzed formed on a substrate using laser aberration, the content of a labelled element in a substrate material is set to be≤1 ppm and position information is formed on a polymer part and/or a substrate. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004212206(A) 申请公布日期 2004.07.29
申请号 JP20020381888 申请日期 2002.12.27
申请人 INSTITUTE OF PHYSICAL & CHEMICAL RESEARCH;HAYASHIZAKI YOSHIHIDE;TORAY IND INC 发明人 HAYASHIZAKI YOSHIHIDE;TANIHATA ISAO;NOBUMASA HITOSHI;HIKASA MASAFUMI
分类号 G01N27/64;G01N27/62;G01N33/483;G01N33/53;G01N37/00;(IPC1-7):G01N27/64 主分类号 G01N27/64
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