METHOD FOR COATING PHOTORESIST UNIFORMLY AND APPARATUS USED THEREFOR

摘要

PURPOSE: A method for coating photoresist uniformly and an apparatus used therefor are provided to improve the uniformity of coating by spinning and vibrating a plate. CONSTITUTION: Photoresist is supplied on a substrate(320) by using a nozzle(360). The substrate is on a plate(300). The photoresist is coated on the substrate by spinning the plate and vibrating simultaneously the plate up and down using a spin part(310) and a vibration part(340). The spin and vibration of the plate is stopped after the photoresist is uniformly coated on the substrate. The coating is performed while the plate is tilted as much as 30 degrees or less.