| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an anti-reflection film having a low internal stress and a sufficiently low reflectance of light from a visible light area to near infrared area. <P>SOLUTION: The anti-reflection film 1 is formed on the surface of a substrate 2, and has a physical film thickness of 300nm or more. When the area of 0-50nm from the substrate 2 of the anti-reflection film 1 is defined as a 1st area 101, the area of 50-100nm as a 2nd area 102, the area of 100-150nm as a 3rd area 103, the area of 150-200nm as a 4th area 104, the area of 200-250nm as a 5th area 105, and the area of 250-300nm as a 6th area 106, the refractive indices of a light of 700nm wavelength are 1.350-1.800 in the 1st area 101, 1.400-1.950 in the 2nd area 102, 1.525-2.100 in the 3rd area 103, 1.700-2.250 in the 4th area 104, 1.850-2.250 in the 5th area 105, and 1.400-2.250 in the 6th area 106, respectively. <P>COPYRIGHT: (C)2004,JPO |
