OVERCOAT COMPOSITION FOR PHOTORESIST

摘要

PURPOSE: An overcoat composition for a photoresist is provided to prevent the CD difference generated between the center and the edge of the wafer in a patterning process using a chemically amplified photoresist. CONSTITUTION: The overcoat composition for a photoresist comprises a compound represented by formula 1, wherein R1 is hydrogen or methyl group, R1 and R2 is hydrogen or C1-C3 alkyl group. The overcoat composition is applied onto the upper side of the photoresist film, and the resultant is exposed to the light, baked and developed to obtain a desired photoresist pattern.