PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRIC DEVICE USING THE SAME

摘要

PURPOSE: A pattern forming method and a method for manufacturing an electric device using the same are provided to be capable of simplifying the manufacturing process and reducing fabrication cost. CONSTITUTION: An etching object layer(103) is formed on a substrate(101). A Ti layer is formed on the etching object layer. The Ti layer is partially transformed into a TiOx layer by carrying out a light irradiation process using a mask. A TiOx pattern(110a) is formed by etching the remaining Ti layer. The etching object layer is selectively etched by using the TiOx pattern as an etching mask. Then, the TiOx pattern is removed from the resultant structure. Preferably, ultraviolet rays or laser beam are used for the light irradiation process.