| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for patterning a transparent conductive film by which an excessive photo lithography step can be eliminated, high productivity be realized, and a high-quality multilayer thin film be also realized. SOLUTION: A laser light 5 whose pattern is shaped through a mask 4 is given to a transparent conductive film 3 formed on a resin layer 2 on a substrate 1, and a part emitted by the laser light 5 in the transparent conductive film 3 is removed from the resin layer 2 for patterning. COPYRIGHT: (C)2004,JPO
|
