发明名称 ANNEALING FURNACE OF FLUORIDE CRYSTAL FOR OPTICAL LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To obtain a large diameter fluoride crystal for optical lithography, which transmits ultra-violet rays of <250 nm and has a small birefringence, by annealing an optical fluoride crystal. SOLUTION: The fluoride crystal for optical lithography is obtained by arranging the optical fluoride crystal 16 in a chamber 12 of an annealing furnace 20 having heating elements 22, 24, then heating the crystal 16 to an annealing temperature along with the shortest heat transfer pathway, and after keeping the crystal 16 at the annealing temperature, gradually cooling the crystal 16. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004131368(A) 申请公布日期 2004.04.30
申请号 JP20030275729 申请日期 2003.07.17
申请人 CORNING INC 发明人 BRENNAN JOHN HAROLD;PRICE MICHAEL WILLIAM;TINZ JUERGEN;WANG LIMING
分类号 C30B29/12;C30B1/00;C30B9/00;C30B11/00;C30B17/00;C30B21/02;C30B28/06;C30B33/00;C30B33/02;(IPC1-7):C30B29/12 主分类号 C30B29/12
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