发明名称 Method of making semiconductor memory device having sources connected to source lines
摘要 A semiconductor memory device includes a silicon semiconductor substrate, a plurality of element isolation regions formed on the silicon semiconductor substrate, a plurality of semiconductor memory cells formed between the element isolation regions, and conductive films formed on the silicon semiconductor substrate and connecting to source diffusion regions of at least two of the semiconductor memory cells.
申请公布号 US6716703(B2) 申请公布日期 2004.04.06
申请号 US20020180311 申请日期 2002.06.27
申请人 FUJITSU LIMITED 发明人 HASHIMOTO HIROSHI
分类号 H01L27/10;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L27/10
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